Packaging & MEMS G-line

HARE-SQ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for permanent applications in which the photoresist remains within the final device. Fully compatible with SU-8 processes.

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